ChE 115 - Electronic Materials Processing

A broad introduction into the gas-phase techniques used to process semiconductor surfaces, from etching to deposition and surface modification. Topics include: Kinetic theory of gases. Surface chemistry and gas-surface interaction dynamics. Physical and chemical vapor deposition of amorphous, polycrystalline and epitaxial layers. Introduction into processing plasmas and their unique ability to drive non-thermal chemistry on surfaces for precisely etch patterns and deposit layers in confined spaces. Role of ions and determination of key parameters that control the ion energy and flux to surfaces.